Patents

Borries Patents

  • All

Apparatus of Charged-Particle Beam Such as Electron Microscope Comprising Sliding Specimen Table Within Objective Lens.

Patent number: 11094499
Abstract: The present invention provides an apparatus of charged-particle beam such as an electron microscope including a specimen table that can slide on a planar surface around the lower pole piece of the objective lens. The specimen table is confined in a specimen stage having one elastic protrusion and one or more elastic force receiving parts (e.g three permanent protrusions) that contact and press the table. When the specimen is under microscopic examination, disturbing vibration cannot generate a force sufficient to overcome the limiting friction between the specimen table and the planar surface of the objective lens. The invention exhibits numerous technical merits such as minimal or zero vibration noise, and improved image quality, among others.
Type: Grant
Filed: February 18, 2021
Date of Patent: August 17, 2021
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Apparatus of Charged-Particle Beam Such as Electron Microscope Comprising Co-Condensers for Continuous Image Resolution Tuning.

Patent number: 11295927
Abstract: The present invention provides an apparatus of charged-particle beam such as an electron microscope with co-condensers. A source of charged particles is configured to emit a beam of charged particles, and the co-condensers including two or more magnetic condensers are configured to coherently focus the beam to a single crossover spot. The invention exhibits numerous technical merits such as continuous image resolution tuning, and automatic switching between multiple resolutions, among others.
Type: Grant
Filed: April 21, 2021
Date of Patent: April 5, 2022
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Electrode Assembly, Electronic Apparatus/Device Using the Same, and Apparatus of Charged-Particle Beam Such as Electron Microscope Using the Same.

Patent number: 11257659
Abstract: The present invention provides an electrode assembly comprising two or more electrodes arranged around a primary axis forming a non-cylindrical channel space. General electronic apparatus/device, particularly apparatus of charged-particle beam such as electron microscope, may use the electrode assembly to create an optimized pattern of electrical field within non-cylindrical channel space. When the electrode assembly is used as a beam deflector in a magnetic objective lens, the electrical field within the central channel space can be co-optimized with the magnetic field for reducing aberration(s) such as distortion, field curvature, astigmatism, and chromatic aberration, after the beam passes through the central channel space.
Type: Grant
Filed: May 12, 2021
Date of Patent: February 22, 2022
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Digital Detector, Apparatus of Charged-Particle Beam Such as Electron Microscope Comprising the Same, and Method Thereof.

Patent number: 11328898
Abstract: The present invention provides a digital high-resolution detector for detecting X-ray, UV light or charged particles. In various embodiments, the digital detector comprises an array of CMOS or CCD pixels and a layer of conversion material on top of the array designed for converting incident X-ray, UV light or charged particles into photons for CMOS or CCD sensors to capture. The thin and high-resolution detector of the invention is particularly useful for monitoring and aligning beams in, and optimizing system performance of, an apparatus of charged-particle beam e.g. an electron microscope.
Type: Grant
Filed: July 8, 2021
Date of Patent: May 10, 2022
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Novel Stage Driving System and Apparatus or Device Such as Apparatus of Charged-Particle Beam Comprising the Same.

Patent number: 11355312
Abstract: The present invention provides a driving system comprising two actuators for moving a stage through two elastic connectors; and a general apparatus/device comprising such a driving system, such as a machine tool, an analytical instrument, an optical microscope, and an apparatus of charged-particle beam such as electron microscope and an electron beam lithographical apparatus. When used in an electron microscope, the stage can be used as a specimen stage or a plate having apertures for electron beam to pass through. The novel stage driving system exhibits numerous technical merits such as simpler structure, better manufacturability, improved cost-effectiveness, and higher reliability, among others.
Type: Grant
Filed: August 1, 2021
Date of Patent: June 7, 2022
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Rapid and Automatic Virus Imaging and Analysis System as well as Methods Thereof.

Patent number: Pending
Abstract: A rapid and automatic virus imaging and analysis system includes (i) electron optical sub-systems (EOSs), each of which has a large field of view (FOV) and is capable of instant magnification switching for rapidly scanning a virus sample; (ii) sample management sub-systems (SMSs), each of which automatically loads virus samples into one of the EOSs for virus sample scanning and then unloads the virus samples from the EOS after the virus sample scanning is completed; (iii) virus detection and classification sub-systems (VDCSs), each of which automatically detects and classifies a virus based on images from the EOS virus sample scanning; and (iv) a cloud-based collaboration sub-system for analyzing the virus sample scanning images, storing images from the EOS virus sample scanning, and storing and analyzing machine data associated with the EOSs, the SMSs, and the VDCSs.
Type: Pending
Filed: October 31, 2021
Date of Patent: Pending
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Apparatus of Charged-Particle Beam Such as Electron Microscope Comprising Plasma Generator, and Method Thereof.

Patent number: Pending
Abstract: The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising an in-column plasma generator for selectively cleaning BSE detector and BF/DF detector. In various embodiments, the plasma generator is located between a lower pole piece of objective lens and the BF/DF detectors, but outside trajectory area of the charged-particles from the sample stage to the BF/DF detector. Cleaning decomposed biological samples or contaminants on the surface of the detectors frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.
Type: Pending
Filed: December 17, 2021
Date of Patent: Pending
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Apparatus of Charged-Particle Beam Such as Electron Microscope Comprising Plasma Generator on Sample Stage, and Method Thereof.

Patent number: Pending
Abstract: The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising an in-column plasma generator for selectively cleaning BSE detector and BF/DF detector. In various embodiments, the plasma generator is located between a lower pole piece of objective lens and the BF/DF detectors, but outside trajectory area of the charged-particles from the sample stage to the BF/DF detector. Cleaning decomposed biological samples or contaminants on the surface of the detectors frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.
Type: Pending
Filed: May 9, 2022
Date of Patent: Pending
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan

Apparatus of Charged-Particle Beam Such as Electron Microscope Comprising Limiting Aperture Immediately below Electron Source, and Method Thereof.

Patent number: Pending
Abstract: The present invention provides an apparatus of electron beam comprising an electron gun with a pinnacle limiting plate having at least one current-limiting aperture. The pinnacle limiting plate is located between a bottom (or lowest) anode and a top (or highest) condenser within the electron gun. A current (ampere) of the electron beam that has passed through the current-limiting aperture remains the same (unchanged) after the electron beam travels through the top condenser and an electron optical column and arrives at a sample space. Electron-electron interaction of the electron beam is thus reduced.
Type: Pending
Filed: August 7, 2022
Date of Patent: Pending
Assignee: BORRIES PTE. LTD.
Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan